XEI Scientific Inc, maker of the popular EVACTRON® De-Contaminator™
Plasma Cleaning System for electron microscopes and other vacuum chambers,
announces their new Evactron® SoftCleanTM specimen cleaning chamber is being used at Nanolab Technologies.
Nanolab Technologies are based in California offering cutting edge technology
and expertise for Failure Analysis, Advanced Microscopy and FIB circuit edit
services. Comprised of an experienced team of analysts using state of the art
equipment, Nanolab delivers guaranteed accuracy and results. They offer both the
expertise and technology that is necessary to provide the solutions to the
ever-increasing challenges that their clients experience with today's shrinking
The microscopy group under Vincent Hou provides TEM/STEM imaging and EDS/EELS
services. They are continually looking at new ways of improving the quality of
services provided to their clients. Nanolab has recently added Evactron®
technology from XEI
Scientific through the Evactron SoftClean specimen cleaning chamber. This
downstream chemical etching system provides a very "gentle" cleaning
As noted by Jein Shyue, VP of Technology Development, "we are now able to
control contamination without either etching/damaging our samples, in
particular, those with polymer fillers."
The Evactron SoftClean System combination is not a "plasma cleaner"
in the usual sense. Samples are cleaned by a downstream RF plasma process that
breaks down hydrocarbons into CO2
, CO & H2
O. This gentle process can prevent specimen
damage that is typically caused by heat and ion bombardment associated with
sputtering of energetic ion species. The delicate downstream process chemically
ashes hydrocarbons and pumps them free of the chamber.
XEI has now sold more than 1,300 Evactron systems worldwide solving
contamination problems in many different environments using instrumentation
such as electron microscopes, FIBs and other vacuum sample chamber set-ups.
Please visit www.evactron.com
for the latest details,